Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer

摘要

In a conventional process for producing a negative resist by selectively exposing a resist layer to an electon beam to insolubilise the exposed zones and then removing the unexposed zones with a solvent, the improvement consists in using polydiallylorthophthalate as the resist layer. The negative resist has high thermal stability and good adhesion to the substrate.