Passivation of RIE patterned al-based alloy films by etching to remove contaminants and surface oxide followed by oxidation

摘要

Aluminum-based alloy films and metallization layers that are patterned by reactive ion etching (RIE) are passivated by etching surface portions of the films or layers with a phosphoric-chromic mixture to remove contaminants and then oxidizing the exposed surface portions in an oxygen atmosphere.