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PROCESS OF ELECTROPLATING AN ARTICIE BY DEPOSITION OF THICK CHROMIUM FILMS FROM AQUEOUS SOLUTIONS OF CHROMIUM(III)-THIOCYANATE COMPLEXES
PROCESS OF ELECTROPLATING AN ARTICIE BY DEPOSITION OF THICK CHROMIUM FILMS FROM AQUEOUS SOLUTIONS OF CHROMIUM(III)-THIOCYANATE COMPLEXES
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机译:通过沉积铬(III)-硫氰酸盐络合物水溶液中的厚铬膜进行电镀的工艺
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摘要
A process of electroplating an article with a layer of chromium exceeding five microns in thickness comprising the step of electroplating the article with an initial layer of chromium from an equilibrated aqueous solutions of chromium (III)-thiocyanate complexes of chromium concentration less than ----- initial layer being thin in comparison with the ----- to be plated, and plating the major proportion ----- containing thickness in one or more steps from an ----- aqueous solution of chromium (III)-thiocyanate complexes of chromium concentration greater than 0.03.
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