QUANTITATIVE ANALYZING METHOD FOR THIN LAYER

摘要

PURPOSE:To measure the layer thickness and element compsn. ratios of a sample in a short period with good accuracy by measuring preliminarily the intensity of characteristic X-rays at plural angles with many standard samples having different layer thicknesses and element compsn. ratios and comparing the same with the measured values of the sample to be measured. CONSTITUTION:The intensity of the characteristic X-rays of the many standard samples having the different compsn. ratios of component elements A, B and layer thicknesses is measured at the angles alpha, beta with the sample surface and are passed through an A/D converter. The layer thickness value and element compsn. ratio are stored as argment for data index into a component ratio file M1 and a layer thickness file M2. The X-rays are irradiated from an X-ray tube 1 to the sample 2 to be measured and the sample 2 is observed at the angles alpha, beta by the two spectroscopes each consisting of a spectral crystal C and an X-ray detector D. The measured characteristic X-ray intensity of the sample 2 is read by the program of a memory 4 for data processing from the stored data. Since the analysis is based on the actual data, the easy quantitative analysis of the compsn. ratio of the component elements and layer thickness with the high accuracy in a short period is made possible.