PROPER MIXTURE FOR PROCESSING PHOTORESIST COMPOSITION AND PROCESSING OF PHOTORESIST COMPOSITION AND METHOD OF PEELING PHOTORESIST FROM BASE BODY

摘要

1. Organic solvent for stripping and cleaning film bases provided with cured or uncured resin-like positive-working or negative-working photoresist mixtures and for diluting said photoresist mixtures, characterized in that it is composed of a mixture of about 1 to 10 parts by weight of propylene glycol alkyl ether acetate and about 1 to 10 parts by weight of propylene glycol alkyl ether.