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Improvements in an acidic aqueous composition for the electrowinning of nickel

机译:用于镍电积的酸性水性组合物的改进

摘要

Plating defects may occur during the electrodeposition of nickel using compositions containing primary and secondary brighteners. According to the invention such defects are avoided by including 0.01 to 1 g/l of a sulfonated acetylenic compound or a salt of such a compound in an aqueous acidic nickel plating bath containing 0.2 to 10 g/l of saccharin, and 20 to 500 parts per million of Zn ions. The acetylenic bond and the sulfonate radical of the sulfonated acetylenic compound are connected by a carbon chain of at least one carbon atom and not more than 6 carbon atoms. The invention relates to the composition of such a bath, to the method of bright nickel plating using such a bath and to compositions for forming the bath.
机译:使用包含初级和次级增白剂的组合物在镍电沉积过程中可能会发生镀层缺陷。根据本发明,通过在含有0.2至10g / l糖精和20至500份糖的含水酸性镍镀浴中包含0.01至1g / l的磺化炔属化合物或此类化合物的盐来避免这种缺陷。百万分之一的锌离子磺化炔属化合物的炔键和磺酸根基团通过至少一个碳原子且不超过6个碳原子的碳链连接。本发明涉及这种浴液的组成,涉及使用这种浴液的光亮镍镀层的方法以及形成浴液的组合物。

著录项

  • 公开/公告号MX153967A

    专利类型

  • 公开/公告日1987-03-03

    原文格式PDF

  • 申请/专利权人 M & T CHEMICALS INC.;

    申请/专利号MX19800183921

  • 发明设计人 KENNETH WILLIAM LEMKE;

    申请日1980-09-12

  • 分类号C25D3/14;

  • 国家 MX

  • 入库时间 2022-08-22 07:20:09

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