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Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography
Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography
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机译:用于实现用于X射线光刻的掩模和晶片的对准和间距控制的设备
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摘要
This invention relates to apparatus for effecting alignment and spacing control of a mask and wafer for use, for example, in x-ray lithography, which includes, in combination, two optical channels for effecting lateral and vertical alignment at two spaced alignment targets respectively on the element, two spaced position sensors located on a line which is oblique with respect to a line joining the two alignment targets, and linkage for maintaining the distances between the position sensors and the element equal one to the other.
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