Process for depositing silicon nitride, device for implementing this process and application of the said process to the manufacture of microwave capacitors

摘要

Process for depositing silicon nitride, device for implementing this process and application of the said process to the manufacture of microwave capacitors. The invention relates to a process for depositing silicon nitride by cathodic sputtering, in which use is made of a silicon nitride target 14 in the presence of a reactive gas flow 25. The invention also relates to a device for implementing this process. Application in particular to the manufacture of microwave capacitors. IMAGE