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METHOD FOR GENERATING EXTREMELY ULTRAHIGH-VACUUM ENVIRONMENT

机译:产生极高真空环境的方法

摘要

PURPOSE:To attain a ultrahigh vacuum by irradiating the periphery of a partial space in a vacuum chamber provided with an evacuating means with a laser beam and evacuating the chamber while a part of the space enclosed by the laser beam is surrounded by a magnetic field region. CONSTITUTION:The periphery of a partial space in a vacuum chamber 9 provided with evacuating means 11-13 is irradiated with a laser beam 1. The chamber is evacuated by the means 11-13 while a part of the space enclosed by the laser beam is surrounded by a magnetic field region 2. Consequently, a ultrahigh vacuum is attained without being affected by the gas generated from the inner wall of the chamber and the material of the pump.
机译:目的:通过用真空束照射设置有抽气装置的真空室中的部分空间的外围,并在被激光束包围的部分空间被磁场区域包围的同时抽空该室,以达到超高真空。组成:设置有抽空装置11-13的真空室9中的部分空间的外围被激光束1照射。该室被装置11-13抽空,而被激光束包围的部分空间被抽空。因此,在不受腔室内壁和泵材料产生的气体影响的情况下,可获得超高真空。

著录项

  • 公开/公告号JPH0471633A

    专利类型

  • 公开/公告日1992-03-06

    原文格式PDF

  • 申请/专利权人 SHARP CORP;

    申请/专利号JP19900184548

  • 发明设计人 OKI ICHIRO;

    申请日1990-07-11

  • 分类号B01J3/00;B01J19/12;

  • 国家 JP

  • 入库时间 2022-08-22 05:37:31

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