首页> 外国专利> Virtually distortion-free imaging system for large field, high resolution lithography

Virtually distortion-free imaging system for large field, high resolution lithography

机译:用于大视场,高分辨率光刻的几乎无失真的成像系统

摘要

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
机译:使用包含大场失真或场曲率的成像系统执行几乎无失真的大场高分辨率成像。掩模版通过光学系统在一个方向上成像,以形成编码掩模。然后,将编码的掩模通过成像系统成像回到位于标线位置的晶圆上。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号