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Process for drying metal surfaces using gaseous hydrides to inhibit moisture adsorption and for removing adsorbed moisture from the metal surfaces
Process for drying metal surfaces using gaseous hydrides to inhibit moisture adsorption and for removing adsorbed moisture from the metal surfaces
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机译:用气态氢化物干燥金属表面以抑制水分吸附并从金属表面除去吸附的水分的方法
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摘要
A process for drying a metal surface to enhance the stability of a gas mixture containing one or more gaseous hydrides in low concentration in contact therewith, which comprises: a) purging gas in contact with the metal surface with inert gas to remove the purged gas, b) exposing the metal surface to an amount of a drying agent comprising an effective amount of gaseous hydride of silicon, germanium, tin or lead, and for a time sufficient to dry the metal surface, and c) purging the drying agent using inert gas.
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