AL-BASED MATERIAL FORMATION-DEFECT DETECTION METHOD AND AL-BASED MATERIAL FORMATION METHOD

摘要

PURPOSE: To provide an At-based material formation-defect detection method wherein the formation defect (the burying defect) in the Al burying operation of an Al-based material by a high-temperature sputtering operation can be detected easily in a short time and the burying defect can be evaluated in terms of number barriers and to provide an Al-based material formation method using it. ;CONSTITUTION: In an Al-based material formation technique, an Al-based material is formed on a substratum material (Ti or the like on a substrate 1) by a high-temperature sputtering operation. In the formation technique, (A) the Al-based material is formed, the Al-based material which has been formed is then removed, and whether a reacted part and a nonreacted part 31 of the Al-based material with the substratum material exist or not is investigated. Thereby, the formation defect of the Al-based material is detected. (B) A pattern part for defect detection and observation use is formed in advance on the substratum material, the Al-based material is then formed, the Al-based material which has been formed is removed in the pattern part for defect detection and observation use and whether the reacted part and the nonreacted part of the Al-based material with the substratum material exist or not is investigated. Thereby, an Al-based material formation method detects the formation defect of the Al-based material.;COPYRIGHT: (C)1994,JPO&Japio