首页> 外国专利> SUPPRESSANT AGAINST DEPOSITION OF POLYMER SCALE, POLYMERIZER SUPPRESSED IN DEPOSITION OF POLYMER SCALE, AND PRODUCTION OF POLYMER

SUPPRESSANT AGAINST DEPOSITION OF POLYMER SCALE, POLYMERIZER SUPPRESSED IN DEPOSITION OF POLYMER SCALE, AND PRODUCTION OF POLYMER

机译:阻垢剂,阻垢剂,阻垢剂,聚合物的生产

摘要

PURPOSE: To effectively suppress the deposition of polymer scales near the interface between the vapor phase and the liquid phase as well as in the liquid phase in the polymerizer in the polymerization of an ethylenically unsaturated monomer and to markedly reduce the formation of fish eyes on a molding of the obtained polymer. ;CONSTITUTION: The suppressant is one used for the polymerization of an ethylenically unsaturated monomer and comprises a nitrogenous organic compound (A) containing neither sulfonic group nor carboxyl group and containing at least five successive conjugated bonds, an anionic organic compound (B) containing at least either of a sulfonic group and a carboxyl group and containing at least five successive conjugated bonds, and an acrylic acid polymer (C). The polymerizer has a coating film containing the above components A, B and C on its inside wall, and the production process comprises conducting the polymerization in this polymerizer.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:在烯键式不饱和单体的聚合反应中,有效抑制聚合物水垢在气相和液相之间的界面附近以及聚合反应器中的液相中沉积,并显着减少鱼眼在玻璃上的形成。成型得到的聚合物。 ;组成:抑制剂是一种用于烯键式不饱和单体聚合的抑制剂,它包含不含有磺酸基和羧基且至少含有五个连续共轭键的含氮有机化合物(A),以及含有至少5个连续共轭键的阴离子有机化合物(B)。磺酸基和羧基中的至少一个,且包含至少五个连续的共轭键,以及丙烯酸聚合物(C)。聚合反应器的内壁上有一层包含上述成分A,B和C的涂膜,生产过程包括在该聚合反应器中进行聚合。版权所有:(C)1993,JPO&Japio

著录项

  • 公开/公告号JPH05320210A

    专利类型

  • 公开/公告日1993-12-03

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP19920154439

  • 发明设计人 WATANABE MIKIO;SHIMIZU TOSHIHIDE;

    申请日1992-05-21

  • 分类号C08F2/00;

  • 国家 JP

  • 入库时间 2022-08-22 04:47:16

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