首页> 外国专利> Method for resolving priority between a calligraphically- displayed point feature and both raster-displayed faces and other calligraphically- displayed point features in a CIG system

Method for resolving priority between a calligraphically- displayed point feature and both raster-displayed faces and other calligraphically- displayed point features in a CIG system

机译:解决在cig系统中书法显示的点特征与栅格显示的面和其他书法显示的点特征之间的优先级的方法

摘要

A method for determining the proper occulation relationship between a calligraphic point and at least one of another calligraphic point and a surface in a raster image, divides the total image screen into an array of spans, each containing an ordered set of pixels which may be further divided into an array of subpixels; determines which of the subpixels on the total screen lie inside each of the raster surfaces and calligraphic points which must be considered for the image totality; then orders the distance of each of the raster surfaces from the viewing point and also orders the distance of each of the point features from the viewing point; and then compares the ordered distances of each point to at least one of the raster surface distances and other point distances to determine which of subpixels of the point or surface/other point are occluded and which subpixels are visible.
机译:一种用于确定书法点与栅格图像中的另一个书法点和表面之间的至少一个之间的合适的咬合关系的方法,将整个图像屏幕划分为一个跨度阵列,每个跨度包含一个有序像素集,该像素集可以进一步分为子像素阵列;确定整个屏幕上的哪些子像素位于每个光栅表面和书法点之内,这对于图像整体而言是必须考虑的;然后命令每个栅格表面到观察点的距离,并且还命令每个点要素到观察点的距离;然后将每个点的有序距离与光栅表面距离和其他点距离中的至少一个进行比较,以确定该点或表面/其他点的哪些子像素被遮挡,并且哪些子像素可见。

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