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Formation manner null of the component and the SiC content coat which possess SiC content
Formation manner null of the component and the SiC content coat which possess SiC content
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机译:具有SiC含量的成分和SiC含量涂层的形成方式无效
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摘要
PURPOSE:To easily form an SiC-containing coating film containing SiC and Si and having high adhesivity, by forming a pure Si layer or an Si layer containing a small amount of SiC on a silicon nitride substrate and successively increasing the content of SiC. CONSTITUTION:A pure Si layer or an Si layer containing a small amount of SiC is deposited on a silicon nitride substrate 1 by passing pure silicon raw material gas (e.g. SiCl4) or a silicon raw material gas containing a small amount of a carbon raw material gas (e.g. C3H8). The ratio of the carbon raw materials gas in the silicon raw material gas is successively increased to form an SiC- containing coating film 2 containing SiC and Si. The part having the obtained SiC-containing coating film 2 has excellent corrosion resistance and abrasion resistance of SiC. Since the coating film 2 contains Si, the thermal expansion difference between the film and the silicon nitride substrate 1 is decreased to keep the film from peeling and cracking.
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