Apparatus for removing nail polish while precluding contact with harsh chemicals and skin irritants

摘要

An apparatus for removing nail polish comprising: a first component of a generally rigid material in an elongated configuration, the first component having an essentially planar lower face and a upper face rounded along its longitudinal axis with a pivot aperture extending laterally through the central extent thereof, the upper surface of the first component being formed with a roughened thumb grip at its leading edge and a roughened finger grip at its trailing edge; a second component of a generally linear extent and fabricated of a rigid material, the second component having a forward planar edge positionable parallel with the forward edge of the first component during operation and use, the second component having a second planar upper surface at an angle with respect to the first planar surface and positionable parallel with the rearward planar surface of the first component when in a compressed orientation, the lower component being formed with a generally curved lower surface with the pair of longitudinally spaced finger receiving regions on its rearward section; and resilient components therebetween.