首页> 外国专利> re - the abure - production method null of Shaun

re - the abure - production method null of Shaun

机译:重新肖恩的荒诞生产方法null

摘要

A mask and a fabrication method therefor that incorporates a patterned radiation blocking layer such as a second patterned high-reflectivity dielectric coating on the back surface of the mask which also includes a first patterned reflective coating on the front. This second high-reflective dielectric coating referred to as a premask, eliminates most of the laser energy directed onto the mask that leads only to substrate heating without effecting the laser energy transmitted through the open area of the mask. The open areas of the premask are sufficiently larger than those in the mask so not to interfere with the illumination geometry (i.e. forms a greater angle than the illumination numerical aperture).
机译:掩模及其制造方法,其在掩模的后表面上结合有图案化的辐射阻挡层,例如第二图案化的高反射率介电涂层,该掩模还包括在正面上的第一图案化的反射涂层。第二种高反射介电涂层称为预掩模,可消除引导到掩模上的大部分激光能量,这些激光能量仅导致基板发热,而不会影响通过掩模开口区域传输的激光能量。预掩模的开口面积比掩模中的开口面积足够大,以免干扰照明几何形状(即,形成比照明数值孔径更大的角度)。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号