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Production manner of semiconductor equipment and semiconductor equipment, and the compound substrate and the compound substrate which are used for semiconductor equipment production manner

机译:半导体设备和半导体设备的生产方式,以及用于半导体设备生产方式的复合基板和复合基板

摘要

A patterned first metal plate (310) is joined to an upper surface of a first ceramic substrate (301), and a second metal plate (330) is joined to an emitter electrode (310E) of the first metal plate (310) through a second ceramic substrate (320). Power devices (4) are mounted on a collector electrode (310C) of the first metal plate (310), and control devices (5) are mounted on the second metal plate (330). The emitter electrode (310E) of a metal layer lies between a high-voltage circuit having the first metal plate (310) and power devices (4) and a control (low-voltage) circuit having the control devices (5) and second metal plate (330). The emitter electrode (310E) serves as a shielding material, and the electrostatic shielding effect prevents noises applied to the high-voltage circuit from being led to the control circuit, so that the faulty operations of the control devices (5) are prevented and the reliability of the semiconductor device is improved. IMAGE
机译:将图案化的第一金属板(310)接合至第一陶瓷基板(301)的上表面,并且将第二金属板(330)通过第一金属板(310)接合至第一金属板(310)的发射电极(310E)。第二陶瓷基板(320)。功率装置(4)安装在第一金属板(310)的集电极(310C)上,控制装置(5)安装在第二金属板(330)上。金属层的发射电极(310E)位于具有第一金属板(310)和功率装置(4)的高压电路与具有控制装置(5)和第二金属的控制(低压)电路之间板(330)。发射极(310E)用作屏蔽材料,并且静电屏蔽效果防止了施加到高压电路的噪声被引入控制电路,从而防止了控制装置(5)的错误操作并且改善了半导体器件的可靠性。 <图像>

著录项

  • 公开/公告号JP2656416B2

    专利类型

  • 公开/公告日1997-09-24

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI KK;

    申请/专利号JP19910331829

  • 发明设计人 ARAI NORYOSHI;OOMACHI HIROFUMI;

    申请日1991-12-16

  • 分类号H01L25/07;H01L23/14;H01L25/18;

  • 国家 JP

  • 入库时间 2022-08-22 03:29:57

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