FORMATION OF ATOMIC SCALE VERTICAL FEATURES FOR TOPOGRAPHIC INSTRUMENT CALIBRATION FOR TOPOGRAPHIC GASTRIC MEASUREMENTS

摘要

Measured objects for the topographical inspection instrument operate at submicrometer isolation levels and have features at vertical heights of spacing of atomic size on the order of 10 angstroms. A feature is formed on a silicon substrate, such as a wafer, by depositing a thick oxide, such as a conventional thermal oxide, on the wafer surface. The pattern of the features is patterned and etched at the level of the unprocessed silicon on the wafer surface. The etched regions are converted to thin oxides that are slightly lowered to the level of silicon in these regions. All of the oxide is removed and a slightly lower level of silicon provides a lift to the feature with a vertical topographic size of atomic size. Millions of such features are created simultaneously on polished wafers to mimic the haze effect or micro-roughness.