首页> 外国专利> METHOD FOR MANUFACTURING A STRUCTURE WITH A USEFUL LAYER REMOTELY REMOVE A SUBSTRATE BY STOPS, AND DEOLIDARIZING SUCH A LAYER

METHOD FOR MANUFACTURING A STRUCTURE WITH A USEFUL LAYER REMOTELY REMOVE A SUBSTRATE BY STOPS, AND DEOLIDARIZING SUCH A LAYER

机译:用有用的层远程制造结构的方法,通过止动件去除基材,并对该层脱脂

摘要

P A method of manufacturing a structure with a useful layer (120) kept at a distance from a substrate (100) by abutments (150, 151) and for separating such a layer. BR/ This method comprises the following steps: BR/ - first partial et selective etching of the sacrificial layer while leaving between the substrate and the useful layer at least one spacer block (140), BR/ - second selective etching of the useful layer (120) and / or the substrate (100) using the spacer (140) as a mask to form at least one stop (150, 151) in said useful layer and / or the substrate, BR/ - elimination said spacer. / P
机译:

一种制造具有有用层(120)的结构的方法,该有用层(120)通过基台(150、151)与基板(100)保持一定距离并用于分离这种层。
该方法包括以下步骤:
-牺牲层的第一部分和选择性蚀刻,同时在衬底和有用层之间留下至少一个间隔块(140),
-第二选择使用间隔物(140)作为掩模蚀刻有用层(120)和/或衬底(100),以在所述有用层和/或衬底中形成至少一个挡块(150、151),
-消除所述垫片。

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