EXIT WINDOW FOR X-RAY LITHOGRAPHY BEAMLINE

摘要

An exit window for an X-ray lithography beamline having a shape and thickness such that the exit window can withstand a pressure differential of at least 14.7 psi and allows an X-ray beam as passed through the window to have X-rays above and below a desired energy band substantially attenuated. The exit window includes a thin material having a window section disposed within an opening of a frame and a peripheral section which is integral with the window section and extends within the frame. The window section has a shape that is substantially concave along its width, substantially linear along its length and tapers to a flat surface near the periphery of the opening. A method of scanning the X-ray beam through a stationary exit window and onto an exposure field on a wafer is also disclosed.