CONTAMINATION DEGREE DETECTING METHOD FOR SUBSTRATE SURFACE, AND DEVICE THEREFOR

摘要

PROBLEM TO BE SOLVED: To efficiently and accurately measure a contamination degree on a surface of a large substrate of silicon wafer or quartz without destroying it. ;SOLUTION: This contamination degree detecting device consists of a flat cooling plate having a cooling function, on the surface of which small protuberances 4 are provided so that the inspected substrate 1 is placed on the protuberances 4, a beam irradiate device 6 which is located above the cooling plate with a space kept from it, so that a parallel beam 9 is irradiated toward the cooling plate and a scattered light observation camera 10 which is located in the space between the cooling plate and the beam irradiating device, and how the inspected surface of the substrate is contaminated is detected by a scattering ring 13 taken by the scattered light observation camera 10.;COPYRIGHT: (C)1999,JPO