TERNARY GAS MIXTURE AND APPLICATION OF THIS MIXTURE TO THE PLASMA PROJECTION OF REFRACTORY MATERIALS

摘要

plasmid consisting of a ternary mixture gas of helium.argon and hydrogen, characterized in that it containsless than 30% of helium, argon and at least 55%, 5.5% and 15%hydrogen.the plasmid according to the invention is gasto be used in a thermal treatment process, such asthe projection of a refractory material or a metallic plasma.