ATOMIC EPITAXY APPARATUS FOR CVD AND LIQUID SOURCE SUPPLY APPARATUS FOR CVD

摘要

The present invention relates to a chemical vapor deposition atomic layer epitaxy device and an external liquid source vapor supply device of the chemical vapor deposition device, in particular, while heating the liquid source used for deposition in an external heating device to generate source vapors, An external liquid source vapor supply device configured to supply a high temperature carrier gas to a liquid source by using a high temperature carrier gas supply device to supply a high temperature source vapor to a reaction chamber of a deposition apparatus without condensation in between. The external liquid source supply device according to the present invention includes a high temperature carrier gas supply device 7 for heating the carrier gas and supplying it to the external liquid source module 8 while controlling the temperature by the temperature regulating device 6, and the temperature. An external liquid source module for supplying the source vapor to the reaction chamber 10 of the deposition apparatus by means of the carrier gas supplied by the hot carrier gas supply device 7 while the temperature is controlled by the regulator 9. (8) and a gas supply tube 4 which insulates and supplies the hot carrier gas and the mixed gas of the hot carrier gas and the source steam. In addition, the external liquid source supply apparatus of the present invention heats the carrier gas at room temperature supplied through the carrier gas supply tube 3, and at the same time, heats the liquid source container to supply a high temperature through the gas supply tube 4. Convection heating type liquid source cabinet 11 for supplying a mixed gas of carrier gas and source steam, and a long meter or more of stainless steel or copper having a shape in which the carrier gas is wound in a long enough time in the cabinet 11 to be heated. The temperature control device 9 for maintaining the temperature in the cabinet 11 while the temperature is continuously measured by a temperature sensor 9a such as a tube 1 and a thermocouple installed in the cabinet 11 and a liquid source are stored. A liquid source container 14.