PRODUCTION OF MANGANESE OXIDE THIN FILM AND LITHIUM BATTERY USING THE MANGANESE OXIDE THIN FILM

摘要

PROBLEM TO BE SOLVED: To directly deposit a -MnO2 thin film on a substrate without using conducting agents and binding agents by controlling the surface temp. of a substrate to be vapor-deposited with a thin film by a reactive sputtering method using manganese sesquioxide as a target to the value equal to or below the specified one. SOLUTION: A reactive sputtering method is adopted, a target 5 is composed of Mn2O3, and the maximum sputtering in which the calculated value temp. in the vapor depositing face (substrate surface) 4a of a substrate 4 reaches =380 deg.C is executed. In this way, on the substrate 4, a -MnO2 thin film, in which the transfer of electric charges is easy to swiftly be executed and moreover high in volume and mass efficiency as conducting agents and binding agents are not used, can be obtd in a short time. Thus, the thinning of a lithiuim battery can be attained. Furthermore, if a thermocouple is directly placed on the surface 4a of the substrate 4, the thermocouple is made into the obstruction of sputtered particles sprung out from the target 5, and the part of a shadow which is not vapor-deposited on the surface 4a is formed, therefore, the temp. of the back face 4b is preferably controlled instead of the temp. of the surface 4a.