首页> 外国专利> FERROELECTRIC BASED MEMORY DEVICES UTILIZING LOW CURIE POINT FERROELECTRICS AND ENCAPSULATION

FERROELECTRIC BASED MEMORY DEVICES UTILIZING LOW CURIE POINT FERROELECTRICS AND ENCAPSULATION

机译:利用低居里点铁电体和封装的铁电体存储设备

摘要

PURPOSE: A ferroelectric memory cell is provided to operate satisfactorily after being subjected to subsequent processing steps including a forming gas anneal. CONSTITUTION: A ferroelectric memory cell(200) is designed to store the information at a temperature less than a first temperature. The memory cell(200) includes top and bottom contacts that sandwich the dielectric layer(213) which includes a ferroelectric material having a Curie point greater than the first temperature and less than 400 degrees C. The dielectric layer(213) is encapsulated in an oxygen impermeable material such that the encapsulating layer(221) prevents oxygen from entering or leaving the dielectric layer(213). One of the contacts typically includes a platinum electrode. The other contact can include a similar electrode or a semiconductor layer having electrodes spaced apart thereon.
机译:目的:提供铁电存储单元,使其在经受包括成形气体退火的后续处理步骤后令人满意地工作。组成:铁电存储单元(200)被设计为在低于第一温度的温度下存储信息。存储器单元(200)包括将电介质层(213)夹在中间的顶部和底部触点,该电介质层(213)包括具有居里点大于第一温度且小于400摄氏度的铁电材料。电介质层(213)被封装在一个氧气不可渗透的材料,使得封装层(221)阻止氧气进入或离开介电层(213)。触点之一通常包括铂电极。另一接触可以包括相似的电极或在其上间隔开电极的半导体层。

著录项

  • 公开/公告号KR20000029616A

    专利类型

  • 公开/公告日2000-05-25

    原文格式PDF

  • 申请/专利权人 RADIANT TECHNOLOGIES INC.;

    申请/专利号KR19997000680

  • 发明设计人 EVANS JOSEPH T JR;

    申请日1999-01-27

  • 分类号H01L27/10;

  • 国家 KR

  • 入库时间 2022-08-22 01:45:47

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