A DEVICE FOR REMOVING THE CONTAMINATED MATERIAL ON THE ANTI-DUST GLASS OF SEMICONDUCTOR STEPPER

摘要

The subject innovation relates to a semiconductor wafer exposure stepper equipment dustproof glass debris removal device, the conventional semiconductor wafer lithography stepper machine was easy to become a foreign substance adhering to the dust-proof glass, and when the foreign matter attached has incompletely transferred to the wafer a pattern defect is generated, whereby there is a problem in that the yield is lowered. Dustproof glass foreign matter removing apparatus of the present design is a semiconductor wafer, which is to seal the portion of the illumination system essentially prevented that the foreign material attached to the dust-proof glass, and if affixed upon by easily removed by the injection of a purge gas including the foreign substance adhering it is possible to reduce the defect pattern.