首页> 外国专利> Anti-parallel longitudinal patterned exchange biased dual stripe magnetoresistive (DSMR) sensor element and method for fabrication thereof

Anti-parallel longitudinal patterned exchange biased dual stripe magnetoresistive (DSMR) sensor element and method for fabrication thereof

机译:反平行纵向图案化交换偏置双条纹磁阻(DSMR)传感器元件及其制造方法

摘要

A dual stripe magnetoresistive (DSMR) sensor element, and a method for fabricating the dual stripe magnetoresistive (DSMR) sensor element. When fabricating the dual stripe magnetoresistive (DSMR) sensor element while employing the method, there are employed two pair of patterned longitudinal magnetic biasing layers formed of a single longitudinal magnetic biasing material longitudinally magnetically biased in substantially anti-parallel directions. When longitudinally magnetically biasing the second pair of patterned longitudinal magnetic biasing layers there is employed a thermal annealing method employing a thermal annealing temperature, a thermal annealing exposure time and an extrinsic magnetic bias field strength such that the pair of longitudinally magnetically biased patterned first longitudinal magnetic biasing layers is not substantially demagnetized.
机译:双条纹磁阻(DSMR)传感器元件,以及制造双条纹磁阻(DSMR)传感器元件的方法。当在采用该方法的同时制造双条磁阻(DSMR)传感器元件时,采用两对图案化的纵向磁偏置层,其由在基本反平行方向上纵向磁偏置的单一纵向磁偏置材料形成。当对第二对图案化的纵向磁偏置层进行纵向磁偏置时,采用热退火方法,该方法采用热退火温度,热退火暴露时间和外部磁偏置场强,使得该对纵向被磁偏置的图案化的第一纵向磁场偏置层基本上没有消磁。

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