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Abrasive null in order to grind the free curved surface

机译:研磨零点,以研磨自由曲面

摘要

PURPOSE: To provide an abrasive which performs uniform and rapid polishing of high quality even in a polishing work for a substance to be polished having a free curved surface. ;CONSTITUTION: An abrasive consists of a base material for a polishing sheet formed of a flexible plastic film having rupture ductility of 150% or more and a polishing layer laminated to at least one surface of the base material for a polishing sheet. The polishing layer comprises a polishing material consisting of a sheet formed of a resin layer containing polishing material grains and a polishing material formed of a double curved molded sheet being a vacuum pressure-formed product wherein an abrasive forms a material for molding.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:提供一种即使在抛光工作中也能对具有自由曲面的被抛光物质进行均匀,快速抛光的高质量磨料。 ;组成:一种磨料,由用于由具有150%或更高的断裂延展性的柔性塑料膜形成的抛光片的基材和层压在该抛光片的基材的至少一个表面上的抛光层组成。抛光层包括抛光材料,该抛光材料由由包含抛光材料颗粒的树脂层形成的片材和由双曲面模制片材形成的抛光材料构成,该双曲面模制片材是真空压力成形产品,其中磨料形成了用于模制的材料。 (C)1993,日本特许厅

著录项

  • 公开/公告号JP3300030B2

    专利类型

  • 公开/公告日2002-07-08

    原文格式PDF

  • 申请/专利权人 大日本印刷株式会社;

    申请/专利号JP19920129589

  • 发明设计人 宮地 貴樹;鈴浦 泰樹;

    申请日1992-04-22

  • 分类号B24D11/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:00:07

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