LAYOUT DESIGN SYSTEM OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, WIRING DESIGN METHOD, WIRING DESIGN PROGRAM, AND MANUFACTURING METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

摘要

PROBLEM TO BE SOLVED: To efficiently select a wiring method by use of via having an arbitrary shape at a high speed in actual wiring processing in which various wiring widths and wiring crossing conditions occur. SOLUTION: This layout design system of a semiconductor integrated circuit device has a library information storage device in which basic via shape list is registered, a technology database storage device indicating the optimum wiring terminal processing for each via shape of the basic via shape list registered in library information, and a central processing controller selecting the optimum wiring processing by referring to the library information storage device and the technology database storage device. This layout design system prepares the technology database storage device indicating the optimum wiring terminal processing for each via shape of the basic via shape list from the library information storage device in which the basic via shape list is registered in advance. When connecting different wirings, the optimum terminal processing method and the optimum via are selected by referring to the technology database storage device.