A photoresist developing nozzle, a photoresist developing apparatus and a photoresist developing method capable of effecting uniform development are provided even in the case of a large diameter wafer. A photoresist nozzle is characterized in comprising a nozzle body (8) having a plurality of small chambers (8A to 8E), developer supply flow passages (14A to 14E) for supplying developer to respective small chambers (8A to 8E), developer discharge sections (10) for discharging developer supplied from the developer supply flow passages (14A to 14E) onto the wafer W. The photoresist developing apparatus has the photoresist developing nozzle and the photoresist developing method uses the photoresist developing nozzle.
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