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Single crystal silicon sensor with high aspect ratio and curvilinear structures

机译:高纵横比和曲线结构的单晶硅传感器

摘要

In one aspect, the invention provides a semiconductor sensor which includes a first single crystal silicon wafer layer. A single crystal silicon structure is formed in the first wafer layer. The structure includes two oppositely disposed substantially vertical major surfaces and two oppositely disposed generally horizontal minor surfaces. The aspect ratio of major surface to minor surface is at least 5:1. A carrier which includes a recessed region is secured to the first wafer layer such that said structure is suspended opposite the recessed region.
机译:在一个方面,本发明提供了一种半导体传感器,其包括第一单晶硅晶片层。在第一晶片层中形成单晶硅结构。该结构包括两个相对布置的基本竖直的主表面和两个相对布置的基本水平的次表面。主表面与次表面的长宽比至少为5:1。包括凹进区域的载体被固定到第一晶片层,使得所述结构悬挂在凹进区域的对面。

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