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METALLIC PROFILE FOR THE FORMATION OF A SCOTIA IN DRY BUILDING CONSTRUCTIONS

机译:干建筑结构中形成扇形的金属轮廓

摘要

etallic profile (1) for scotia formation in dry building constructions and in particular in the region of interference of a suspended furred ceiling for plasterboard sheet or similar material (10) and the surrounding walls (14) consisting of at least one surface (5) for coating the cut perimeter of the said plasterboard sheet or similar material (10), where the width of the said surface (5) defines the depth of the scotia formed and of at least one surface (3) extending vertically towards the said surface (5) towards the wall (14), where the width of the said surface (3) defines the width of the scotia formed. The proposed metallic profile 1 is selectivity extendable into a suitable perimetric profile for the reception of the channels 11which bear the plasterboard sheet or similar material 10, which through suitable suspension elements 12 are connected by fitting with screws 16 to the roof 15 of the space and/or a vertical, downwards extending decorative element of a variable morphology which satisfies the requirement served by the perimetric decorative element from plaster of the prior technology.
机译:在干燥建筑结构中尤其是在石膏板或类似材料的悬挂式吊顶天花板(10)和由至少一个表面(5)构成的围墙(14)的干涉区域中,用于形成壁tia的典型轮廓(1)用于涂覆所述石膏板片或类似材料(10)的切割周边,其中所述表面(5)的宽度限定所形成的视点的深度以及至少一个表面(3)垂直向所述表面延伸( 5)朝向壁(14),其中所述表面(3)的宽度限定了所形成的刻痕的宽度。所提出的金属型材1可以选择性地扩展到合适的周边型材中,以容纳带有石膏板或类似材料10的通道11,该通道通过合适的悬挂元件12通过用螺钉16安装到空间的屋顶15上而连接。 /或具有可变形态的垂直向下延伸的装饰元件,其满足现有技术的灰泥的周向装饰元件所满足的要求。

著录项

  • 公开/公告号GR20000100401A

    专利类型

  • 公开/公告日2002-09-26

    原文格式PDF

  • 申请/专利权人 DIAMORFOTIKI AVEE;

    申请/专利号GR20000100401

  • 发明设计人 GEFYROPOULOS PANAGIOTI STAVROS;

    申请日2000-11-15

  • 分类号E04B9/30;

  • 国家 GR

  • 入库时间 2022-08-22 00:45:21

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