Ultrastructure analysis of nano-structures, comprises forming grid on carrier with reactive features formed by nano-lithography to give set binding sites and specific orientations for analysis by photon or particle beams

摘要

Ultrastructure analysis of bio-molecular structures and other nano-structures comprising using a nano-lithographic process to give a specific and oriented screen array for the structures with a total diameter of 5-200 nanometers, is new. Ultrastructure analysis uses a carrier for the nanolithography of a nature which allows analysis of the bonded nano-structures by photons or particle beam methods. Chemically reactive binding sites are located at points by the nano-lithography, where the gaps between the sites are equal to or greater than the wavelength of the photon or particle beam. The grid on the two-dimensional carrier can form a screen with grid points at 100 nanometer intervals, but this is not mandatory. The nano-lithography forms a reactive feature at each site, with an initial binding point with an extension which, in one direction, is smaller than the dimensions of the nano-structure to be analyzed or the under unit to be bonded e.g. its diameter. The structure or the under unit is bonded by cross linking to give the required orientation. The nano-lithography forms a second reactive feature binding point, at a gap from the first binding point, which is equal to or greater than the nano-structure for analysis e.g. with 10 nanometers between their centers. The extension of the second binding point at least in one direction is smaller than the diameter of the nano-structure for analysis or its under unit e.g. of = 5 nanometers. The second binding point is aligned in relation to the first so that all the paired binding points on the carrier have the same horizontal or vertical orientation. The nano-structure for analysis or its under unit can be bonded to the second binding point by cross linking, to give a second orientation. The nano-structures can be bonded in place with three binding points, using three under units for each nano-structure, to be held on the carrier in a given array. In general, an individual site can have one or more binding sites, with 30 nanometer gaps between them. The paired binding sites are spaced apart by -100 nanometers which is equal to or greater than the wavelength of the photon or particle beam used in the analysis procedure.