Electronic line drawing picture device and electronic line drawing picture manner

摘要

PURPOSE: To enable obtaining a pattern having an arbitrary pitch in the order of nanometers. CONSTITUTION: This electron beam lithography system provides a new lighography means using electron beam holography and equipped with at least two single crystal thin films 2a, 2b in which an electron beam 1 is made to enter, and a converging means 3 which converges a transmitted electron beam 1a which permeates the single crystal thin films 2a, 2b and an electron beam 1b diffracted by the single crystal thin films, on the surface or the like of a mask board. The drawing of a fringe pattern having a specified pitch formed by making the transmitted electron beam 1a interfere with the diffracted electron beam 1b is performed.