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METHOD OF MAKING NON-FOGGING FILM AND NON-FOGGING ARTICLE TREATED BY THE METHOD

机译:制作无雾膜和经该方法处理的无雾物品的方法

摘要

PROBLEM TO BE SOLVED: To make a non-fogging film provided with non-fogging property persistence and scratching flaw resistance without the occurrence of the deterioration in non-fogging performance and the degradation in scratching flaw resistance in a base material.;SOLUTION: A coating film containing an epoxy compound is formed on a base material and this film is impregnated with a phosphorus non-fogging material having active hydrogen to react an epoxy group and the active hydrogen of the phosphorus compound, by which the compound is uniformly distributed at a high concentration near the extreme surface of the coating film and the non-fogging film having the excellent non-fogging property persistence and scratching flaw resistance is made.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:制备具有无雾性持久性和耐刮擦缺陷性的无雾膜,而不会在基材中发生无雾性能的劣化和耐刮擦性缺陷的劣化。在基材上形成含有环氧化合物的涂膜,并在该膜中浸渍具有活性氢的磷非雾化材料,使环氧基与磷化合物的活性氢反应,从而使该化合物均匀分布在硅上。在涂膜和无雾膜的最表面附近形成高浓度,具有优异的无雾性持久性和耐刮擦性。.版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003010775A

    专利类型

  • 公开/公告日2003-01-14

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20010199709

  • 发明设计人 KAWASE AKIKO;NAKAJIMA MIKITO;

    申请日2001-06-29

  • 分类号B05D5/00;B05D1/18;B32B27/38;G02B1/10;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:33

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