首页> 外国专利> METHOD AND DEVICE FOR ELECTRODEPOSITION OF THREE- DIMENSIONAL MICRO-ELECTRODEPOSITED STRUCTURE, ELECTRODE FOR MANUFACTURING THREE-DIMENSIONAL MICRO- ELECTRODEPOSITED STRUCTURE, AND METHOD AND DEVICE FOR ELECTRODEPOSITION USING THE ELECTRODE

METHOD AND DEVICE FOR ELECTRODEPOSITION OF THREE- DIMENSIONAL MICRO-ELECTRODEPOSITED STRUCTURE, ELECTRODE FOR MANUFACTURING THREE-DIMENSIONAL MICRO- ELECTRODEPOSITED STRUCTURE, AND METHOD AND DEVICE FOR ELECTRODEPOSITION USING THE ELECTRODE

机译:三维微电沉积结构的电沉积方法和装置,制造三维微电沉积结构的电极,以及使用该电极进行电沉积的方法和装置

摘要

PROBLEM TO BE SOLVED: To provide a method and a device for electrodeposition of a three- dimensional micro-electrodeposited structure for improving the dimensional accuracy of the deposit, an electrode for manufacturing the three-dimensional micro-electrodeposited structure, and a method and a device for electrodeposition using the electrode.;SOLUTION: The three-dimensional micro-electrodeposited structure is manufactured by controlling a current wire by using a shielding plate having a small hole and independently movable from an electrode. The electrode for manufacturing the three-dimensional micro-electrodeposited structural body comprises an electrode material which is larger in size than the deposit and a current wire bundle body to converge the current lines generated by the electrode material, and electrodeposition is performed by using the electrode.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种用于电沉积三维微电沉积结构以提高沉积物的尺寸精度的方法和装置,一种用于制造三维微电沉积结构的电极,方法和装置。解决方案:三维微电沉积结构是通过使用带有小孔并且可以独立于电极移动的屏蔽板控制电流线来制造的。用于制造三维微电沉积结构体的电极包括尺寸大于沉积物的电极材料和电流线束体,以汇聚由该电极材料产生的电流线,并通过使用该电极进行电沉积。 。;版权:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2003277968A

    专利类型

  • 公开/公告日2003-10-02

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL MINING CO LTD;

    申请/专利号JP20020082657

  • 发明设计人 SUGAMOTO NORIAKI;MAKI KOICHIRO;

    申请日2002-03-25

  • 分类号C25D1/00;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:21

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