Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same

摘要

A sulfonyloxime compound is provided which is represented by a general formula (1): chemistry chemdraw filechemistry mol file;wherein, R¹ represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R² represents an alkyl group, an aryl group, or a heteroaryl group; X represents a halogen atom; Y represents —R³, a —CO—R³ group, —COO—R³ group, —CONR³R⁴ group, —S—R³ group, —SO—R³ group, —SO₂—R³ group, a —CN group or a —NO₂ group, and R³ and R⁴ within the Y group each represent a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, although any two of R¹, R² and R³ may also be bonded together to form a cyclic structure, and furthermore dimers of a compound represented by the general formula (1) in which R¹, R² or Y groups from separate molecules are bonded together to form a single bivalent group, are also possible. This compound is very useful as a radiation sensitive acid generator which is sensitive to activated radiation such as far ultraviolet radiation or electron beams and the like, and displays superior heat stability and storage stability. Furthermore, chemically amplified positive type or negative type radiation sensitive resin compositions incorporating such a radiation sensitive acid generator are also provided.