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Optical barrier and methods for forming the optical barrier without etching a transparent layer below the optical barrier
Optical barrier and methods for forming the optical barrier without etching a transparent layer below the optical barrier
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机译:光学阻挡层和在不蚀刻光学阻挡层下方的透明层的情况下形成光学阻挡层的方法
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摘要
An optical barrier made of tungsten (W) or titanium-tungsten (TiW). A layer of the optical barrier material is deposited over a transparent layer such as indium tin oxide (ITO). The optical barrier material is then patterned using photolithography processing steps and a dry etchant. The patterned optical barrier material acts as a light-shielding layer over a light-sensing device to form a dark reference device or dark pixel.
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