首页> 外国专利> MULTILAYERED CAPACITOR STRUCTURE WITH ALTERNATELY CONNECTED CONCENTRIC LINES FOR DEEP SUBMICRON CMOS

MULTILAYERED CAPACITOR STRUCTURE WITH ALTERNATELY CONNECTED CONCENTRIC LINES FOR DEEP SUBMICRON CMOS

机译:深亚微米CMOS交替连接中心线的多层电容器结构

摘要

A capacitor structure having a first and at least a second level of electrically conductive concentric lines of an open-loop configuration. The conductive lines of the at least second level overlie the conductive lines of the first level. A dielectric material is disposed between the first and second levels of conductive lines and between the conductive lines in each of the first and second levels. The conductive lines are electrically connected in an alternating manner to terminals of opposing polarity so that capacitance is generated between adjacent lines in each level and in adjacent levels. The capacitor especially useful in deep sub-micron CMOS.
机译:一种具有开环配置的第一级和至少第二级导电同心线的电容器结构。至少第二级的导线覆盖第一级的导线。介电材料设置在第一和第二级导线之间以及第一和第二级中的每个导线之间。导线以交替的方式电连接到相反极性的端子,从而在每个级别和相邻级别的相邻线之间产生电容。该电容器在深亚微米CMOS中特别有用。

著录项

  • 公开/公告号EP1275136A2

    专利类型

  • 公开/公告日2003-01-15

    原文格式PDF

  • 申请/专利权人 KONINKLIJKE PHILIPS ELECTRONICS N.V.;

    申请/专利号EP20010938074

  • 发明设计人 SOWLATI TIRDAD;VATHULYA VICKRAM;

    申请日2001-04-02

  • 分类号H01L21/02;H01L27/08;H01L27/06;

  • 国家 EP

  • 入库时间 2022-08-21 23:50:47

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