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MANUFACTURE OF DUAL DAMASCENE WIRING OF FINE ELECTRONIC ELEMENT USING INORGANIC FILLER WHICH DOES NOT CONTAIN HYBRID TYPE LOW DIELECTRIC CONSTANT SUBSTANCE AND CARBON
MANUFACTURE OF DUAL DAMASCENE WIRING OF FINE ELECTRONIC ELEMENT USING INORGANIC FILLER WHICH DOES NOT CONTAIN HYBRID TYPE LOW DIELECTRIC CONSTANT SUBSTANCE AND CARBON
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机译:使用不包含混合型低介电常数物质和碳的无机填充剂制造精细电子元件的双金属引线
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摘要
PROBLEM TO BE SOLVED: To provide a manufacture of dual damascene wiring of a fine electronic element using an inorganic filler which does not contain hybrid type low dielectric constant substance and carbon.;SOLUTION: In a manufacture of the dual damascene wiring, an insulating film where a dual damascene region is formed is a hybrid type insulating film of 3.3 or less of a dielectric constant, and a via filler is made of an inorganic matter containing no carbon. Thus, the electrical characteristics are enhanced and a defect is prevented.;COPYRIGHT: (C)2004,JPO
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