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Conductive lines, coaxial lines, integrated circuitry, and methods of forming conductive lines, coaxial lines, and integrated circuitry

机译:导线,同轴线,集成电路以及形成导线,同轴线和集成电路的方法

摘要

Conductive lines, such as co-axial lines, integrated circuitry incorporating such conductive lines, and methods of forming the same are described. In one aspect, a substrate having an outer surface is provided. A masking material is formed over the outer surface and subsequently patterned to form a conductive line pattern. An inner conductive layer is formed within the conductive line pattern, followed by formation of a dielectric layer thereover and an outer conductive layer over the dielectric layer. Preferred implementations include forming the inner conductive layer through electroplating, or alternatively, electroless plating techniques. Other preferred implementations include forming the dielectric layer from suitable polymer materials having desired dielectric properties. A vapor-deposited dielectric layer of Parylene is one such preferred dielectric material.
机译:描述了诸如同轴线之类的导线,并入有此类导线的集成电路及其形成方法。一方面,提供了一种具有外表面的基板。掩模材料形成在外表面上,并且随后被图案化以形成导线图案。在导线图案内形成内部导电层,然后在其上形成介电层,并在介电层上方形成外部导电层。优选的实施方式包括通过电镀或可替代地,化学镀技术形成内部导电层。其他优选的实施方式包括由具有期望的介电特性的合适的聚合物材料形成介电层。聚对二甲苯的气相沉积介电层是一种这样的优选介电材料。

著录项

  • 公开/公告号US6774491B2

    专利类型

  • 公开/公告日2004-08-10

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US20010887049

  • 发明设计人 KIE Y. AHN;

    申请日2001-06-21

  • 分类号H01L234/80;H01L235/20;

  • 国家 US

  • 入库时间 2022-08-21 23:16:03

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