Ag ALLOY THIN FILM FOR USE AS REFLECTIVE FILM OF FPD (FLAT PANEL DISPLAY) IN LCD, SPUTTERING TARGET, AND METHOD FOR PRODUCING Ag ALLOY THIN FILM

摘要

PURPOSE: To provide an Ag-alloy thin film having high reflectance and superior adhesiveness to a substrate and superior corrosion resistance as well, and to provide a sputtering target and a method for producing the Ag-alloy thin film. CONSTITUTION: The Ag alloy thin film comprises Ag as a main component, 0.1 to 4.0 atom.% of Au and 0.1 to 2.5 atom.% of Sn, wherein the Ag alloy thin film further comprises 0.1 to 3.0 atom.% of oxygen. The sputtering target comprises Ag as a main component, 0.1 to 4.0 atom.% of Au and 0.1 to 2.5 atom.% of Sn, wherein the sputtering target further comprises 0.1 to 3.0 atom.% of oxygen. The method for producing the Ag-alloy thin film comprises the steps of employing an Ag alloy sputtering target, supplying an Ar gas as a sputtering gas and at least one or more of oxygen contained gases selected from O2, H2O and H2+O2 as an additive gas, and sputtering the target to manufacture the Ag alloy film containing Ag as a main component, 0.1 to 4.0 atom.% of Au and 0.1 to 2.5 atom.% of Sn and additionally containing 0.1 to 3.0 atom.% of oxygen, wherein the oxygen contained gases are supplied only during the initial stage of film forming by the sputter, and wherein a primer layer is formed by depositing the Ag alloy thin film on a metal oxide film in such a way that the Ag alloy thin film is produced by sputtering the sputtering target with or without supplying of the additive gas.