首页> 外国专利> Process for depositing nanotubes on planar surfaces used in the semiconductor industry comprises applying a stamp on a substrate to form a microfluidic capillary system, contacting a dispersion of nanotubes, drying, and removing the stamp

Process for depositing nanotubes on planar surfaces used in the semiconductor industry comprises applying a stamp on a substrate to form a microfluidic capillary system, contacting a dispersion of nanotubes, drying, and removing the stamp

机译:在半导体工业中使用的在平面表面上沉积纳米管的方法包括在基板上施加压模以形成微流体毛细管系统,接触纳米管的分散体,干燥并除去压模

摘要

Process for nanotube deposition on planar surfaces comprises preparing stamp from elastomeric material having relief structure on one stamp surface, applying stamp to substrate so that substrate and stamp form microfluidic capillary system having inlet and outlet and made from one or more capillaries, contacting nanotube dispersion with capillary system inlet so that dispersion spreads in system under capillary force, drying dispersion, and removing stamp. An Independent claim is also included for an electronic component made from a substrate having discrete structures of nanotubes.
机译:在平面表面上沉积纳米管的方法包括:从在一个压模表面上具有浮雕结构的弹性体材料制备压模,将压模施加到基材上,以使基材和压模形成具有入口和出口并由一个或多个毛细管制成的微流体毛细管系统,使纳米管分散液与毛细管系统入口,以便分散液在毛细管力的作用下扩散到系统中,干燥分散液并除去印模。还包括由具有离散的纳米管结构的基板制成的电子部件的独立权利要求。

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