首页> 外国专利> Semiconductor device, e.g. gate-commutated thyristor with press-contact structure, has protruding contact section formed on gate electrode for making contact with press-contact carrier block

Semiconductor device, e.g. gate-commutated thyristor with press-contact structure, has protruding contact section formed on gate electrode for making contact with press-contact carrier block

机译:半导体器件具有压接结构的栅极换向晶闸管,具有形成在栅电极上的突出接触部分,用于与压接载流子块接触

摘要

A semiconductor substrate has a gate electrode (1a,1a') and a cathode electrode (1b) on one side, and an anode electrode on the other side. The gate electrode faces a press-contact carrier block (6). A protruding contact section (1a') is formed on the gate electrode for making contact with the press-contact carrier block. An insulating layer (1d) is formed on the surface of the gate electrode and extends to a point adjacent to the protruding contact. An independent claim is included for a further semiconductor device.
机译:半导体衬底在一侧上具有栅电极(1a,1a′)和阴极(1b),在另一侧上具有阳极。栅电极面对压接载体块(6)。突出的接触部分(1a’)形成在栅电极上,用于与压接载体块接触。绝缘层(1d)形成在栅电极的表面上并且延伸到与突出接触相邻的点。对于另一半导体器件包括独立权利要求。

著录项

  • 公开/公告号DE102004006989A1

    专利类型

  • 公开/公告日2004-08-26

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI K.K. TOKIO/TOKYO;

    申请/专利号DE20041006989

  • 发明设计人 TOKUNOH FUTOSHI;OOTA KENJI;

    申请日2004-02-12

  • 分类号H01L23/48;H01L29/745;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:09

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