METHOD OF FORMING HIGHLY ORIENTED CARBON NANOTUBE AND APPARATUS SUITABLE FOR FORMING HIGHLY ORIENTED CARBON NANOTUBE

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a highly oriented carbon nanotube (CNT) thin film by a plasma CVD method and an apparatus suitable for forming the highly oriented CNT thin film by the plasma CVD method.;SOLUTION: A catalyst containing at least one of metals of Fe, Co, Ni, Ga, In(ITO), Al and Sn is stuck on the surface of a substrate 10. The substrate 10 on which the catalyst is stuck is held with a substrate holding part 5 arranged in a chamber 2. A carbon-containing gas is supplied to the chamber 2 and plasma electrons are generated inside the chamber 2 from a microwave generation part 6 so as not to directly irradiate the substrate 10. As the apparatus suitable for the method, a shielding member 7 is provided between the substrate holding part 5 and the microwave generation part 6.;COPYRIGHT: (C)2005,JPO&NCIPI