PHOTOSENSITIVE RESIN COMPOSITION FOR DIFFUSE REFLECTING UNDERLAYER FORMATION, PHOTOSENSITIVE ELEMENT FOR DIFFUSE REFLECTING UNDERLAYER FORMATION, DIFFUSE REFLECTING BOARD FOR REFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE USING THE ELEMENT, MANUFACTURING METHOD OF THE DIFFUSE REFLECTING BOARD AND REFLECTIVE LIQUID CRYSTAL DISPLAY USING THE DIFFUSE REFLECTING BOARD

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin and a photosensitive element for forming a diffuse reflecting underlayer having both of irregularities transfer property and a resolution property, to provide a diffuse reflecting board for reflective liquid crystal display device using the element and a manufacturing method of the diffuse reflecting board, and to provide a reflective liquid crystal display using the diffuse reflecting board.;SOLUTION: The photosensitive resin composition for a diffuse reflecting underlayer formation comprises (I) an acrylic polymer (c) essentially consisting of copolymer components of unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride (a) and epoxy group-containing unsaturated compound (b) as copolymerization components, (II) a photopolymerizable compound having at least two ethylenic unsaturated groups and (III) a photopolymerization initiator. The photosensitive element for a diffuse reflecting underlayer formation is made by laminating the resin composition on a rugged surface of a temporal supporter having an irregular shape. The diffuse reflecting board for reflective liquid crystal display device is made by using the element.;COPYRIGHT: (C)2005,JPO&NCIPI