PHOTOMASK FOR NEAR FIELD LIGHT EXPOSURE, METHOD FOR CONTROLLING INTENSITY DISTRIBUTION OF NEAR FIELD LIGHT USING THE PHOTOMASK, AND METHOD AND DEVICE FOR FORMING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photomask for near-field light exposure, a method for controlling the intensity distribution of near-field light using the photomask, and a method and a device for forming pattern capable of controlling the intensity distribution of near-field light to an arbitrary intensity distribution.;SOLUTION: A photomask for near-field light exposure for controlling the intensity distribution of near-field light is provided with a microaperture whose aperture width is less than 1/2 of an optical source wavelength of an exposure light. A recess or protrusion 104 is provided near the microaperture 103. The intensity distribution of near-field light can be controlled to an arbitrary intensity distribution by the recess or the protrusion.;COPYRIGHT: (C)2005,JPO&NCIPI