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ANTI-POLLUTION EQUIPMENT, ANTI-POLLUTION METHOD, AND ANTI-POLLUTION PROGRAM

机译:反污染设备,反污染方法和反污染程序

摘要

PROBLEM TO BE SOLVED: To on/off-control an anti-pollution equipment without affecting facilities on the semiconductor manufacturing apparatus side.;SOLUTION: A pressure gage 7 for monitoring the pressure in a pipe 4 is installed in the pipe 4 between a plasma type abatement system 5 and a turbopump 3. A controller 8 actuates the plasma type anti-pollution equipment 5 when the pressure measured by the pressure gage 7 is in a specified range, and stops the plasma type abatement system 5 when the pressure measured by the pressure gate 7 is out of the specified range.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:在不影响半导体制造装置侧的设备的情况下开/关控制防污染设备;解决方案:在等离子体之间的管4中安装有用于监测管4中的压力的​​压力计7。型减排系统5和涡轮泵3。控制器8在由压力计7测量的压力处于指定范围内时致动等离子体型防污染设备5,并且在由压力计7测量的压力下使等离子体型减排系统5停止。压力门7超出规定范围。;版权:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2004342921A

    专利类型

  • 公开/公告日2004-12-02

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20030139198

  • 发明设计人 SUGIURA TOSHIKAZU;

    申请日2003-05-16

  • 分类号H01L21/205;B01J19/08;

  • 国家 JP

  • 入库时间 2022-08-21 22:30:03

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