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Resistance defect assessment device, resistance defect assessment method, and method for manufacturing resistance defect assessment device

机译:电阻缺陷评估装置,电阻缺陷评估方法以及制造电阻缺陷评估装置的方法

摘要

A resistance defect assessment device provided on a wafer for assessing a resistance variation defect in a component of an integrated circuit device, the resistance defect assessment device including test patterns capable of measuring a resistance variation component to be the resistance variation defect in each chip area or each shot area of the wafer, wherein the number of test patterns included in one chip area or one shot area is set so that it is possible to estimate the yield of the integrated circuit device.
机译:在晶片上提供的电阻缺陷评估装置,用于评估集成电路器件的部件中的电阻变化缺陷,该电阻缺陷评估装置包括能够测量作为每个芯片区域或芯片区域中的电阻变化缺陷的电阻变化分量的测试图案。晶片的每个压射区,其中设置在一个芯片区域或一个压射区中包括的测试图案的数量,以便可以估计集成电路器件的成品率。

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